Highly absorptive thin films for integrated photonic devices
Name
79629159-MIT.pdf
Description
Full printable version
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811.75 KB
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5706e068003b9ee33b485672a1bcc427
Author(s)
Bradley, Michael Scott
Advisor(s)
Vladimir Bulović.
Date Issued
2006
Publisher
Massachusetts Institute of Technology
Abstract
Highly absorptive thin films serve as the active layer of a new class of photonic devices based on the strong coupling of light and matter. In order to develop these devices into a new field of integrated photonics, methods for analysis, patterning, and deposition of the active layer are necessary. This thesis develops these methods and applies them to thin films of J-aggregates grown in a layer-by-layer (LBL) process, which have been shown to have remarkable optical and morphological properties and have recently enabled the demonstration of strong coupling between light and matter in an electroluminescent device at room temperature. J-aggregate thin films are analyzed using Kramers-Kronig regression to determine their complex index of refraction, an important parameter involved in photonic device design. Additionally, a soft lithography method is demonstrated for patterning and deposition of LBL J-aggregate thin films. Together, these methods can be used to further enable integrated photonics based on the strong coupling of light and matter.
Description
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2006.
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Includes bibliographical references (p. 52-53).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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