Using statistical metrology to understand pattern-dependent ILD thickness variation in oxide CMP processes
Name
38164372-MIT.pdf
Description
Full printable version
Size
7.45 MB
Format
Adobe PDF
Checksum (MD5)
0a38f8aaaa1da1eec3257e483406bee4
Author(s)
Divecha, Rajesh Ramji
Advisor(s)
Duane Boning, James Chung.
Date Issued
1997
Publisher
Massachusetts Institute of Technology
Description
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.
Includes bibliographical references (leaves 46-47).
Subjects
Electrical Engineering and Computer Science
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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