High resolution fabrication of nanostructures using controlled proximity nanostencil lithography
Name
2014 - Jain - High Resolution Fabrication of Nanostructures using Controlled Proximity Nanostencil Lithography.pdf
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Author(s)
Aernecke, M.
Jain, Tarun
Liberman, Vladimir
Karnik, Rohit
Date Issued
February 2014
Journal
Applied Physics Letters
Publisher
American Institute of Physics (AIP)
Citation
Jain, T., M. Aernecke, V. Liberman, and R. Karnik. “High Resolution Fabrication of Nanostructures Using Controlled Proximity Nanostencil Lithography.” Applied Physics Letters 104, no. 8 (February 24, 2014): 083117.
Version
Author's final manuscript
Abstract
Nanostencil lithography has a number of distinct benefits that make it an attractive nanofabrication processes, but the inability to fabricate features with nanometer precision has significantly limited its utility. In this paper, we describe a nanostencil lithography process that provides sub-15 nm resolution even for 40-nm thick structures by using a sacrificial layer to control the proximity between the stencil and substrate, thereby enhancing the correspondence between nanostencil patterns and fabricated nanostructures. We anticipate that controlled proximity nanostencil lithography will provide an environmentally stable, clean, and positive-tone candidate for fabrication of nanostructures with high resolution.
MIT Department
Lincoln Laboratory
Massachusetts Institute of Technology. Department of Mechanical Engineering
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Creative Commons Attribution-Noncommercial-Share Alike
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DOI of Published Version
https://doi.org/10.1063/1.4867014
