Tensile Lattice Strain Accelerates Oxygen Surface Exchange and Diffusion in La[subscript 1-x]Sr[subscript x]CoO[subscript 3-δ] Thin Films
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Zubicek_2013-Tensile lattice strain.pdf
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Author(s) • • • • •
Kubicek, Markus
Cai, Zhuhua
Ma, Wen
Yildiz, Bilge
Hutter, Herbert
Fleig, Jurgen
Date Issued
March 2013
Journal
ACS Nano
Publisher
American Chemical Society (ACS)
Citation
Kubicek, Markus, Zhuhua Cai, Wen Ma, Bilge Yildiz, Herbert Hutter, and Jurgen Fleig. “Tensile Lattice Strain Accelerates Oxygen Surface Exchange and Diffusion in La1–xSrxCoO3−δ Thin Films.” ACS Nano 7, no. 4 (April 23, 2013): 3276-3286. © 2013 American Chemical Society
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Final published version
Abstract
The influence of lattice strain on the oxygen exchange kinetics and diffusion in oxides was investigated on (100) epitaxial La[subscript 1–x]Sr[subscript x]CoO[subscript 3−δ] (LSC) thin films grown by pulsed laser deposition. Planar tensile and compressively strained LSC films were obtained on single-crystalline SrTiO[subscript 3] and LaAlO[subscript 3]. [superscript 18]O isotope exchange depth profiling with ToF-SIMS was employed to simultaneously measure the tracer surface exchange coefficient k* and the tracer diffusion coefficient D* in the temperature range 280–475 °C. In accordance with recent theoretical findings, much faster surface exchange (~4 times) and diffusion (~10 times) were observed for the tensile strained films compared to the compressively strained films in the entire temperature range. The same strain effect—tensile strain leading to higher k* and D*—was found for different LSC compositions (x = 0.2 and x = 0.4) and for surface-etched films. The temperature dependence of k* and D* is discussed with respect to the contributions of strain states, formation enthalpy of oxygen vacancies, and vacancy mobility at different temperatures. Our findings point toward the control of oxygen surface exchange and diffusion kinetics by means of lattice strain in existing mixed conducting oxides for energy conversion applications.
MIT Department
Massachusetts Institute of Technology. Department of Nuclear Science and Engineering
Massachusetts Institute of Technology. Laboratory for Electrochemical Interfaces
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DOI of Published Version
https://doi.org/10.1021/nn305987x