The ion-beam reactive sputtering process for deposition of niobium nitride thin films
Name
24250339-MIT.pdf
Description
Full printable version
Size
29.26 MB
Format
Adobe PDF
Checksum (MD5)
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Author(s)
Lichtenwalner, Daniel Jenner
Advisor(s)
David A. Rudman and Alfredo C. Anderson.
Date Issued
1990
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990.
Vita.
Includes bibliographical references (leaves 284-290).
Subjects
Materials Science and Engineering
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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