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  5. High-accuracy, speed-optimized positioning system for electron beam lithography

High-accuracy, speed-optimized positioning system for electron beam lithography

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11836111-MIT.pdf

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Author(s)
Dadok, Luděk.
Advisor(s)
James K. Roberge.
Date Issued
1982
Publisher
Massachusetts Institute of Technology
Description
Thesis: M.S., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 1982
Vita.
Includes bibliographical references.
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
MIT theses may be protected by copyright. Please reuse MIT thesis content according to the MIT Libraries Permissions Policy, which is available through the URL provided.
http://dspace.mit.edu/handle/1721.1/7582
Persistent DSpace Link
https://hdl.handle.net/1721.1/158470
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