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  5. Sub-micron gate lithography in an MMIC production environment

Sub-micron gate lithography in an MMIC production environment

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Author(s)
Moran, Peter William
Advisor(s)
Rebecca M. Henderson and Jesús A. del Alamo.
Date Issued
1990
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1990, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering, 1990.
Includes bibliographical references (leaves 195-197).
Subjects
Sloan School of Management
Electrical Engineering
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering
Sloan School of Management
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Persistent DSpace Link
http://hdl.handle.net/1721.1/13600
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