Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules
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Brimhall-2011-Breaking the Far-Field Diffraction Limit in Optical Nanopatterning.pdf
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Author(s)
Brimhall, Nicole
Manthena, Rajakumar Varma
Menon, Rajesh
Andrew, Trisha Lionel
Date Issued
November 2011
Journal
Physical Review Letters
Publisher
American Physical Society (APS)
Citation
Brimhall, Nicole et al. “Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules.” Physical Review Letters 107.20 (2011): Web. 23 Mar. 2012. © 2011 American Physical Society
Version
Final published version
Abstract
By saturating a photochromic transition with a nodal illumination (wavelength, λ), one isomeric form of a small molecule is spatially localized to a region smaller than the far-field diffraction limit. A selective oxidation step effectively locks this pattern allowing repeated patterning. Using this approach and a two-beam interferometer, we demonstrate isolated lines as narrow as λ/8 (78 nm) and spacing between features as narrow as λ/4 (153 nm). This is considerably smaller than the minimum far-field diffraction limit of λ/2. Most significantly, nanopatterning is achieved via single-photon reactions and at low light levels, which in turn allow for high throughput.
MIT Department
Massachusetts Institute of Technology. Department of Chemistry
Massachusetts Institute of Technology. Research Laboratory of Electronics
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DOI of Published Version
https://doi.org/10.1103/PhysRevLett.107.205501
