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Iron distribution in silicon after solar cell processing: Synchrotron analysis and predictive modeling

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Author(s)
Fenning, David P.
•
Hofstetter, Jasmin
•
Bertoni, Mariana I.
•
Hudelson, S.
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Rinio, M.
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Lelievre, J. F.
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Lai, Barry
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del Canizo, C.
•
Buonassisi, Tonio
Date Issued
April 2011
Journal
Applied Physics Letters
Publisher
American Institute of Physics (AIP)
Citation
Fenning, D. P. et al. “Iron Distribution in Silicon After Solar Cell Processing: Synchrotron Analysis and Predictive Modeling.” Applied Physics Letters 98.16 (2011): 162103. ©2011 American Institute of Physics
Version
Author's final manuscript
Abstract
The evolution during silicon solar cell processing of performance-limiting iron impurities is investigated with synchrotron-based x-ray fluorescence microscopy. We find that during industrial phosphorus diffusion, bulk precipitate dissolution is incomplete in wafers with high metal content, specifically ingot border material. Postdiffusion low-temperature annealing is not found to alter appreciably the size or spatial distribution of FeSi[subscript 2] precipitates, although cell efficiency improves due to a decrease in iron interstitial concentration. Gettering simulations successfully model experiment results and suggest the efficacy of high- and low-temperature processing to reduce both precipitated and interstitial iron concentrations, respectively.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
Persistent DSpace Link
http://hdl.handle.net/1721.1/78005
DOI of Published Version
https://doi.org/10.1063/1.3575583
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