Metalorganic chemical vapor deposition of aluminum nitride and gallium nitride
Name
26572000-MIT.pdf
Description
Full printable version
Size
8.85 MB
Format
Adobe PDF
Checksum (MD5)
79364c23b45faf701d87fc2df67edb2a
Author(s)
Ho, Kwok-Lun
Advisor(s)
Klaus F. Jensen.
Date Issued
1992
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992.
Includes bibliographical references (leaves 147-152).
Subjects
Chemical Engineering
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
Terms of Use
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