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  5. Metalorganic chemical vapor deposition of aluminum nitride and gallium nitride

Metalorganic chemical vapor deposition of aluminum nitride and gallium nitride

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Author(s)
Ho, Kwok-Lun
Advisor(s)
Klaus F. Jensen.
Date Issued
1992
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992.
Includes bibliographical references (leaves 147-152).
Subjects
Chemical Engineering
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
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M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
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http://hdl.handle.net/1721.1/13142
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