Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications

Labelle, Catherine B., 1972-

Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications

Download

Name

45131356-MIT.pdf

Description

Full printable version

Size

17.16 MB

Format

Adobe PDF

Checksum (MD5)

51a5d63a40923927ff843d3995270f87

Author(s)

Labelle, Catherine B., 1972-

Advisor(s)

Karen K. Gleason.

Date Issued

1999

Publisher

Massachusetts Institute of Technology

Description

Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.

Includes bibliographical references.

Subjects

Chemical Engineering.

MIT Department

Massachusetts Institute of Technology. Department of Chemical Engineering

Terms of Use

M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

http://dspace.mit.edu/handle/1721.1/7582

Persistent DSpace Link

http://hdl.handle.net/1721.1/85358