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  5. Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications

Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications

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Author(s)
Labelle, Catherine B., 1972-
Advisor(s)
Karen K. Gleason.
Date Issued
1999
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.
Includes bibliographical references.
Subjects
Chemical Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
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M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Persistent DSpace Link
http://hdl.handle.net/1721.1/85358
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