Device and material investigations of GaN enhancement-mode transistors for Venus and harsh environments
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172104_1_5.0186976.pdf
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Checksum (MD5)
42db489f5b5ff79bd46658fe436c34a7
Author(s)
Xie, Qingyun
Niroula, John
Rajput, Nitul S.
Yuan, Mengyang
Luo, Shisong
Fu, Kai
Isamotu, Mohamed Fadil
Palash, Rafid Hassan
Sikder, Bejoy
Eisner, Savannah R.
Date Issued
April 22, 2024
Journal
Applied Physics Letters
Publisher
AIP Publishing
Citation
Qingyun Xie, John Niroula, Nitul S. Rajput, Mengyang Yuan, Shisong Luo, Kai Fu, Mohamed Fadil Isamotu, Rafid Hassan Palash, Bejoy Sikder, Savannah R. Eisner, Harshad Surdi, Aidan J. Belanger, Patrick K. Darmawi-Iskandar, Zlatan Aksamija, Robert J. Nemanich, Stephen M. Goodnick, Debbie G. Senesky, Gary W. Hunter, Nadim Chowdhury, Yuji Zhao, Tomás Palacios; Device and material investigations of GaN enhancement-mode transistors for Venus and harsh environments. Appl. Phys. Lett. 22 April 2024; 124 (17): 172104.
Version
Final published version
Abstract
This Letter reports the device and material investigations of enhancement-mode p-GaN-gate AlGaN/GaN high electron mobility transistors (HEMTs) for Venus exploration and other harsh environment applications. The GaN transistor in this work was subjected to prolonged exposure (11 days) in a simulated Venus environment (460 °C, 94 bar, complete chemical environment including CO2/N2/SO2). The mechanisms affecting the transistor performance and structural integrity in harsh environment were analyzed using a variety of experimental, simulation, and modeling techniques, including in situ electrical measurement (e.g., burn-in) and advanced microscopy (e.g., structural deformation). Through transistor, Transmission Line Method (TLM), and Hall-effect measurements vs temperature, it is revealed that the mobility decrease is the primary cause of reduction of on-state performance of this GaN transistor at high temperature. Material analysis of the device under test (DUT) confirmed the absence of foreign elements from the Venus atmosphere. No inter-diffusion of the elements (including the gate metal) was observed. The insights of this work are broadly applicable to the future design, fabrication, and deployment of robust III-N devices for harsh environment operation.
Subjects
Physics and Astronomy (miscellaneous)
MIT Department
Massachusetts Institute of Technology. Microsystems Technology Laboratories
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DOI of Published Version
https://doi.org/10.1063/5.0186976
