Sacrificial-Post Templating Method for Block Copolymer Self-Assembly
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smll.201301066_Manuscript.pdf
Description
Main Article
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722.31 KB
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Author(s)
Alexander-Katz, Alfredo
Ross, Caroline A.
Berggren, Karl K.
Tavakkoli Kermani Ghariehali, Amir
Nicaise, Sam
Hannon, Adam F.
Gotrik, Kevin W.
Date Issued
July 2013
Journal
Small
Publisher
Wiley Blackwell
Citation
Tavakkoli K. G., Amir, Samuel M. Nicaise, Adam F. Hannon, Kevin W. Gotrik, Alfredo Alexander-Katz, Caroline A. Ross, and Karl K. Berggren. “Sacrificial-Post Templating Method for Block Copolymer Self-Assembly.” Small 10, no. 3 (July 10, 2013): 493–499.
Version
Author's final manuscript
Abstract
A sacrificial-post templating method is presented for directing block copolymer self-assembly to form nanostructures consisting of monolayers and bilayers of microdomains. In this approach, the topographical post template is removed after self-assembly and therefore is not incorporated into the final microdomain pattern. Arrays of nanoscale holes of different shapes and symmetries, including mesh structures and perforated lamellae with a bimodal pore size distribution, are produced. The ratio of the pore sizes in the bimodal distributions can be varied via the template pitch, and agrees with predictions of self consistent field theory.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Massachusetts Institute of Technology. Research Laboratory of Electronics
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Creative Commons Attribution-Noncommercial-Share Alike
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DOI of Published Version
https://doi.org/10.1002/smll.201301066
