6.152J / 3.155J Microelectronics Processing Technology, Fall 2003
Name
6-152JFall2003/OcwWeb/Electrical-Engineering-and-Computer-Science/6-152JFall2003/CourseHome/index.htm
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15.03 KB
Format
HTML
Checksum (MD5)
6fe62b47eeef85d927c49321e0598eb4
Author(s)
Schmidt, Martin A.
O'Handley, Robert C., 1942-
Ruff, Susan
Alternative Title
Microelectronics Processing Technology
Date Issued
December 2003
Abstract
Introduces the theory and technology of integrated-circuit fabrication. Lectures and laboratory sessions on basic processing techniques such as diffusion, oxidation, epitaxy, photolithography, chemical vapor deposition, and plasma etching. Emphasis on the interrelationships between material properties, device structure, and the electrical behavior of devices. Provides background for thesis work in microelectronics or for 6.151. From the course home page: Course Description This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.
Subjects
microelectronics
Microelectronics processing
integrated circuits
vacuum
chemical vapor deposition
CVD
oxidation
diffusion
implantation
lithography
soft lithography
etching
sputtering
evaporation
interconnect
metallization
crystal growth
reliability
fabrication
processing
photolithography
physical vapor deposition
MOS
MOS capacitor
microcantilever
microfluidic
6.152J
3.155J
6.152
3.155
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
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