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dc.contributor.advisorLionel C. Kimerling.en_US
dc.contributor.authorMorse, Michael Tyen_US
dc.date.accessioned2005-08-18T20:10:02Z
dc.date.available2005-08-18T20:10:02Z
dc.date.copyright1997en_US
dc.date.issued1997en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/10380
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997.en_US
dc.descriptionIncludes bibliographical references (leaves 111-116).en_US
dc.description.statementofresponsibilityby Michael Ty Morse.en_US
dc.format.extent116 leavesen_US
dc.format.extent8801789 bytes
dc.format.extent8801549 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineeringen_US
dc.titleGrowth of erbium-doped Si/SiGe double heterostructures by ultra-high vacuum chemical vapor depositionen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc37525748en_US


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