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Ion beam assisted deposition of biaxially aligned oxide thin films

dc.contributor.advisorMichael J. Cima.en_US
dc.contributor.authorRessler, Kevin Glennen_US
dc.date.accessioned2005-08-18T17:11:07Z
dc.date.available2005-08-18T17:11:07Z
dc.date.copyright1996en_US
dc.date.issued1996en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/10601
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.en_US
dc.descriptionIncludes bibliographical references (leaves 216-221).en_US
dc.description.statementofresponsibilityby Kevin Glenn Ressler.en_US
dc.format.extent221 leavesen_US
dc.format.extent15416455 bytes
dc.format.extent15416211 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineeringen_US
dc.titleIon beam assisted deposition of biaxially aligned oxide thin filmsen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Dept. of Materials Science and Engineeringen_US
dc.identifier.oclc36147709en_US


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