| dc.contributor.advisor | Duane S. Boning. | en_US |
| dc.contributor.author | Wong, Ka Shun | en_US |
| dc.date.accessioned | 2005-08-18T17:46:30Z | |
| dc.date.available | 2005-08-18T17:46:30Z | |
| dc.date.copyright | 1996 | en_US |
| dc.date.issued | 1996 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/10682 | |
| dc.description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996. | en_US |
| dc.description | Includes bibliographical references (p. 132-137). | en_US |
| dc.description.statementofresponsibility | by Ka Shun Wong. | en_US |
| dc.format.extent | 146 p. | en_US |
| dc.format.extent | 11069572 bytes | |
| dc.format.extent | 11069325 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Mechanical Engineering | en_US |
| dc.title | Real-time analysis and control of plasma etching via full wafer interferometry | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Mechanical Engineering | |
| dc.identifier.oclc | 36398768 | en_US |
