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dc.contributor.advisorClifton G. Fonstad.en_US
dc.contributor.authorElcess, Kimberleyen_US
dc.contributor.otherMassachusetts Institute of Technology. Department of Materials Science and Engineering.en_US
dc.date.accessioned2017-06-06T19:22:11Z
dc.date.available2017-06-06T19:22:11Z
dc.date.copyright1988en_US
dc.date.issued1988en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/109624
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1988.en_US
dc.descriptionOn t.p. all "x̳" is subscript.en_US
dc.descriptionIncludes bibliographical references.en_US
dc.description.statementofresponsibilityKimberley Elcess.en_US
dc.format.extent180 leavesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsMIT theses are protected by copyright. They may be viewed, downloaded, or printed from this source but further reproduction or distribution in any format is prohibited without written permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectMaterials Science and Engineering.en_US
dc.titleThe effect of strain and orientation on Inx̳Ga₁₋x̳As layers grown by molecular beam epitaxyen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc19283326en_US


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