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dc.contributor.authorSmith, Brendan Derek
dc.contributor.authorPatil, Jatin J
dc.contributor.authorFerralis, Nicola
dc.contributor.authorGrossman, Jeffrey C.
dc.date.accessioned2017-10-10T19:51:43Z
dc.date.available2017-10-10T19:51:43Z
dc.date.issued2016-03
dc.date.submitted2016-02
dc.identifier.issn1944-8244
dc.identifier.issn1944-8252
dc.identifier.urihttp://hdl.handle.net/1721.1/111825
dc.description.abstractNanoporous silicon (NPSi) has received significant attention for its potential to contribute to a large number of applications, but has not yet been extensively implemented because of the inability of current state-of-the-art nanofabrication techniques to achieve sufficiently small pore size, high aspect ratio, and process scalability. In this work we describe the fabrication of NPSi via a modified metal-assisted chemical etching (MACE) process in which silica-shell gold nanoparticle (SiO₂-AuNP) monolayers self-assemble from solution onto a silicon substrate. Exposure to the MACE etchant solution results in the rapid consumption of the SiO₂ spacer shell, leaving well-spaced arrays of bare AuNPs on the substrate surface. Particles then begin to catalyze the etching of nanopore arrays without interruption, resulting in the formation of highly anisotropic individual pores. The excellent directionality of pore formation is thought to be promoted by the homogeneous interparticle spacing of the gold core nanocatalysts, which allow for even hole injection and subsequent etching along preferred crystallographic orientations. Electron microscopy and image analysis confirm the ability of the developed technique to produce micrometer-scale arrays of sub 10 nm nanopores with narrow size distributions and aspect ratios of over 100:1. By introducing a scalable process for obtaining high aspect ratio pores in a novel size regime, this work opens the door to implementation of NPSi in numerous devices and applications. (Graph Presented).en_US
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/ACSAMI.6B01927en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT Web Domainen_US
dc.titleCatalyst Self-Assembly for Scalable Patterning of Sub 10 nm Ultrahigh Aspect Ratio Nanopores in Siliconen_US
dc.typeArticleen_US
dc.identifier.citationSmith, Brendan D. et al. “Catalyst Self-Assembly for Scalable Patterning of Sub 10 nm Ultrahigh Aspect Ratio Nanopores in Silicon.” ACS Applied Materials & Interfaces 8, 12 (March 2016): 8043–8049 © 2016 American Chemical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.mitauthorSmith, Brendan Derek
dc.contributor.mitauthorPatil, Jatin J
dc.contributor.mitauthorFerralis, Nicola
dc.contributor.mitauthorGrossman, Jeffrey C.
dc.relation.journalACS Applied Materials & Interfacesen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2017-10-10T17:50:42Z
dspace.orderedauthorsSmith, Brendan D.; Patil, Jatin J.; Ferralis, Nicola; Grossman, Jeffrey C.en_US
dspace.embargo.termsNen_US
dc.identifier.orcidhttps://orcid.org/0000-0001-5255-6957
dc.identifier.orcidhttps://orcid.org/0000-0003-4148-2424
dc.identifier.orcidhttps://orcid.org/0000-0003-1281-2359
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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