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Deposition and characterization of silicon-germanium alloy thin films on oxide

dc.contributor.advisorRafael Reif.en_US
dc.contributor.authorTsai, Julie Annen_US
dc.date.accessioned2005-08-17T19:08:27Z
dc.date.available2005-08-17T19:08:27Z
dc.date.copyright1995en_US
dc.date.issued1995en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/11511
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995.en_US
dc.descriptionIncludes bibliographical references (p. 177-187).en_US
dc.description.statementofresponsibilityby Julie Ann Tsai.en_US
dc.format.extent187 p.en_US
dc.format.extent15866075 bytes
dc.format.extent15865830 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineeringen_US
dc.titleDeposition and characterization of silicon-germanium alloy thin films on oxideen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc33669043en_US


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