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dc.contributor.advisorHenry I. Smith.en_US
dc.contributor.authorHector, Scott D. (Scott Daniel)en_US
dc.date.accessioned2005-08-16T23:03:03Z
dc.date.available2005-08-16T23:03:03Z
dc.date.copyright1994en_US
dc.date.issued1994en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/11617
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994.en_US
dc.descriptionIncludes bibliographical references (leaves 263-274).en_US
dc.description.statementofresponsibilityby Scott D. Hector.en_US
dc.format.extent274 leavesen_US
dc.format.extent21256978 bytes
dc.format.extent21256732 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectElectrical Engineering and Computer Scienceen_US
dc.titleOptimization of image formation in X-ray lithography using rigorous electromagnetic theory and experimentsen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc32052989en_US


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