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dc.contributor.advisorRuonan.en_US
dc.contributor.authorHolloway, Jack Wade,1980-en_US
dc.contributor.otherMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.en_US
dc.date.accessioned2021-05-24T20:23:14Z
dc.date.available2021-05-24T20:23:14Z
dc.date.copyright2021en_US
dc.date.issued2021en_US
dc.identifier.urihttps://hdl.handle.net/1721.1/130765
dc.descriptionThesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, September, February, 2021en_US
dc.descriptionCataloged from the official PDF of thesis.en_US
dc.descriptionIncludes bibliographical references (pages 175-184).en_US
dc.description.abstractWith the end of Moore's Law and Dennard scaling in silicon platforms, coupled with the increase in computational demand across applications, the semiconductor industry has seen a move towards high-density compute leveraging multiple dies in package. These types of products have been partially enabled by short-reach, energy-efficient, high-speed interconnect in package. Big data and AI/ML applications have pushed the development of longer-reach, high-capacity, and energy efficient interconnect enabling connectivity between racks across large data centers. This work investigates and demonstrates a new interconnect technology that fills a meter-class interconnect gap in these applications. By leveraging the wide transmission bandwidth and low-losses associated with dielectric waveguides in the sub-THz regime (100 GHz - 1 THz), large baseband data rates are aggregated across multiple channels, multiplexed on to a single electrical channel, efficiently coupled into a dielectric waveguide, and transmitted between chips. In this work, enabling component technologies are developed and demonstrated, including planar broadband couplers and high-performance sub-THz multiplexers operating in the 220-330 GHz WR-3.4 band -- both technologies designed to ease implementation and packaging costs. Lastly, an end-to-end link is realized in a 130nm Silicon Germanium BiCMOS process and is demonstrated utilizing a small cross-section polymer dielectric waveguide. The link achieves 105 Gbps in a 250 ̄ 400 [mu]m² waveguide cross section, demonstrating a state of the art 330 Gbps/mm figure of merit and better than 5 pJ/bit energy efficiency.en_US
dc.description.statementofresponsibilityby Jack W. Holloway.en_US
dc.format.extent184 pagesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsMIT theses may be protected by copyright. Please reuse MIT thesis content according to the MIT Libraries Permissions Policy, which is available through the URL provided.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectElectrical Engineering and Computer Science.en_US
dc.titleEnergy efficient sub-terahertz electrical interconnecten_US
dc.typeThesisen_US
dc.description.degreePh. D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.identifier.oclc1252061479en_US
dc.description.collectionPh.D. Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Scienceen_US
dspace.imported2021-05-24T20:23:14Zen_US
mit.thesis.degreeDoctoralen_US
mit.thesis.departmentEECSen_US


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