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Fabrication of large-area 100 nm-period gratings using achromatic holographic lithography

dc.contributor.advisorHenry I. Smith.en_US
dc.contributor.authorYen, Anthonyen_US
dc.date.accessioned2005-08-15T16:00:41Z
dc.date.available2005-08-15T16:00:41Z
dc.date.copyright1991en_US
dc.date.issued1992en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/13078
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1992.en_US
dc.descriptionIncludes bibliographical references (leaves 79-87).en_US
dc.description.statementofresponsibilityby Anthony Yen.en_US
dc.format.extent100 leavesen_US
dc.format.extent5924676 bytes
dc.format.extent5924434 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectElectrical Engineering and Computer Scienceen_US
dc.titleFabrication of large-area 100 nm-period gratings using achromatic holographic lithographyen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc26329656en_US


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