Remote epitaxy of III-N membranes on amorphous boron nitride
Author(s)
Liu, Yunpeng(Mechanical engineer)Massachusetts Institute of Technology.
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Other Contributors
Massachusetts Institute of Technology. Department of Mechanical Engineering.
Advisor
Jeehwan Kim.
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Amorphous boron nitride (aBN) has found broad applications in industrial applications. Thick aBN has been thoroughly investigated¹,², including the recent revisiting of this material at nanometer thickness. However, most investigations of aBN so far have been based on three-dimensional structures. In this thesis, Molecular-Beam Epitaxy (MBE) grown monolayer aBN in two-dimensional structure is demonstrated. In-situ gallium nitride (GaN) remote epitaxy is finished on the transparent monolayer aBN. By doing the in-situ remote epitaxy, contaminations are avoided, and epitaxial membrane quality is improved. Multi-stacking technique is developed to further enhance the manufacturing efficiency of the free-standing GaN film. Surface acoustic wave (SAW) strain sensor fabricated by free-standing ultrathin single crystalline GaN film shows good performances. Process to solve GaN device heat dissipation is presented. Relaxed InGaN film grown on aBN monolayer provides a new research direction for GaN based red LED.
Description
Thesis: S.M., Massachusetts Institute of Technology, Department of Mechanical Engineering, February, 2021 Cataloged from the official PDF version of thesis. Includes bibliographical references (pages 35-37).
Date issued
2021Department
Massachusetts Institute of Technology. Department of Mechanical EngineeringPublisher
Massachusetts Institute of Technology
Keywords
Mechanical Engineering.