Microstructural modification of thin films and its relation to the electromigration-limited reliability of VLSI interconnects

Author(s)
Longworth, Hai Pham
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Advisor
Carl V. Thompson.
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Description
Thesis (Sc. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1992.
 
Includes bibliographical references (leaves 246-262).
 
Date issued
1992
URI
http://hdl.handle.net/1721.1/13114
Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Publisher
Massachusetts Institute of Technology
Keywords
Materials Science and Engineering
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