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Growth and characterization of low temperature silicon selective epitaxy

dc.contributor.advisorRafael Reif.en_US
dc.contributor.authorYew, Tri-Rungen_US
dc.date.accessioned2005-08-10T22:32:47Z
dc.date.available2005-08-10T22:32:47Z
dc.date.copyright1990en_US
dc.date.issued1990en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/13640
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990.en_US
dc.descriptionIncludes bibliographical references (leaves 204-210).en_US
dc.description.statementofresponsibilityby Tri-Rung Yew.en_US
dc.format.extent210 leavesen_US
dc.format.extent25288496 bytes
dc.format.extent25288254 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineeringen_US
dc.titleGrowth and characterization of low temperature silicon selective epitaxyen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc24250400en_US


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