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dc.contributor.authorJeon, Jisoo
dc.contributor.authorTan, Alvin TL
dc.contributor.authorLee, Jaeyong
dc.contributor.authorPark, Jeong Eun
dc.contributor.authorWon, Sukyoung
dc.contributor.authorKim, Sanha
dc.contributor.authorBedewy, Mostafa
dc.contributor.authorGo, Jamison
dc.contributor.authorKim, Jin Kon
dc.contributor.authorHart, A John
dc.contributor.authorWie, Jeong Jae
dc.date.accessioned2021-12-22T22:47:46Z
dc.date.available2021-12-22T15:29:00Z
dc.date.available2021-12-22T22:47:46Z
dc.date.issued2020
dc.identifier.issn1936-086X
dc.identifier.urihttps://hdl.handle.net/1721.1/138764.2
dc.description.abstract© Evaporative self-assembly of semiconducting polymers is a low-cost route to fabricating micrometer and nanoscale features for use in organic and flexible electronic devices. However, in most cases, rate is limited by the kinetics of solvent evaporation, and it is challenging to achieve uniformity over length- and time-scales that are compelling for manufacturing scale-up. In this study, we report high-throughput, continuous printing of poly(3-hexylthiophene) (P3HT) by a modified doctor blading technique with oscillatory meniscus motion - meniscus-oscillated self-assembly (MOSA), which forms P3HT features ∼100 times faster than previously reported techniques. The meniscus is pinned to a roller, and the oscillatory meniscus motion of the roller generates repetitive cycles of contact-line formation and subsequent slip. The printed P3HT lines demonstrate reproducible and tailorable structures: nanometer scale thickness, micrometer scale width, submillimeter pattern intervals, and millimeter-to-centimeter scale coverage with highly defined boundaries. The line width as well as interval of P3HT patterns can be independently controlled by varying the polymer concentration levels and the rotation rate of the roller. Furthermore, grazing incidence wide-angle X-ray scattering (GIWAXS) reveals that this dynamic meniscus control technique dramatically enhances the crystallinity of P3HT. The MOSA process can potentially be applied to other geometries, and to a wide range of solution-based precursors, and therefore will develop for practical applications in printed electronics.en_US
dc.description.sponsorshipInha University research grant (59398-1)en_US
dc.description.sponsorshipNSF-CAREER Award (CMMI- 134663)en_US
dc.description.sponsorshipNSF-GOALI (1463181)en_US
dc.description.sponsorshipNational Research Foundation of Korea (2013R1A3A2042196)en_US
dc.language.isoen
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofhttps://dx.doi.org/10.1021/ACSNANO.0C07268en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceMIT web domainen_US
dc.titleHigh-Speed Production of Crystalline Semiconducting Polymer Line Arrays by Meniscus Oscillation Self-Assemblyen_US
dc.typeArticleen_US
dc.identifier.citationJeon, Jisoo, Tan, Alvin TL, Lee, Jaeyong, Park, Jeong Eun, Won, Sukyoung et al. 2020. "High-Speed Production of Crystalline Semiconducting Polymer Line Arrays by Meniscus Oscillation Self-Assembly." ACS Nano, 14 (12).en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Laboratory for Manufacturing and Productivityen_US
dc.relation.journalACS Nanoen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2021-12-22T14:37:35Z
dspace.orderedauthorsJeon, J; Tan, ATL; Lee, J; Park, JE; Won, S; Kim, S; Bedewy, M; Go, J; Kim, JK; Hart, AJ; Wie, JJen_US
dspace.date.submission2021-12-22T14:37:39Z
mit.journal.volume14en_US
mit.journal.issue12en_US
mit.licenseOPEN_ACCESS_POLICY
mit.metadata.statusPublication Information Neededen_US


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