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dc.contributor.authorLiapis, Andreas C.
dc.contributor.authorSubramanian, Ashwanth
dc.contributor.authorCho, Sangyeon
dc.contributor.authorKisslinger, Kim
dc.contributor.authorNam, Chang‐Yong
dc.contributor.authorYun, Seok‐Hyun
dc.date.accessioned2022-04-11T19:06:06Z
dc.date.available2022-03-16T15:52:05Z
dc.date.available2022-04-11T19:06:06Z
dc.date.issued2020-11
dc.date.submitted2020-10
dc.identifier.issn2196-7350
dc.identifier.urihttps://hdl.handle.net/1721.1/141217.2
dc.description.abstract© 2020 The Authors. Advanced Materials Interfaces published by Wiley-VCH GmbH A novel atomic layer method for encapsulating individual micro- and nano-particles with thin (sub-10-nm) dielectric films is presented. This method leverages the diffusion of vapor-phase precursors through an underlying inert polymer film to achieve growth of a metal oxide film on all sides of the particle simultaneously, even on the side that is in contact with the substrate. Crucially, the deposition is performed on stationary particles and does not require an agitation mechanism or a special reaction chamber. Here, conformal coatings of alumina are shown to improve stability in aqueous environments for two optically relevant particles: compound semiconductor laser microparticles and lead halide perovskite nanocrystals.en_US
dc.language.isoen
dc.publisherWileyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1002/admi.202001323en_US
dc.rightsCreative Commons Attribution 4.0 International licenseen_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_US
dc.sourceWileyen_US
dc.titleConformal Coating of Freestanding Particles by Vapor‐Phase Infiltrationen_US
dc.typeArticleen_US
dc.identifier.citationLiapis, AC, Subramanian, A, Cho, S, Kisslinger, K, Nam, CY et al. 2020. "Conformal Coating of Freestanding Particles by Vapor-Phase Infiltration." Advanced Materials Interfaces, 7 (24).en_US
dc.contributor.departmentHarvard University--MIT Division of Health Sciences and Technology
dc.relation.journalAdvanced Materials Interfacesen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2022-03-16T15:41:16Z
dspace.orderedauthorsLiapis, AC; Subramanian, A; Cho, S; Kisslinger, K; Nam, CY; Yun, SHen_US
dspace.date.submission2022-03-16T15:41:18Z
mit.journal.volume7en_US
mit.journal.issue24en_US
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work Neededen_US


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