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dc.contributor.authorShih, Pao-Chuan
dc.contributor.authorRughoobur, Girish
dc.contributor.authorEngel, Zachary
dc.contributor.authorAhmad, Habib
dc.contributor.authorDoolittle, William Alan
dc.contributor.authorAkinwande, Akintunde I.
dc.contributor.authorPalacios, Tomas
dc.date.accessioned2022-07-13T13:56:42Z
dc.date.available2022-07-13T13:56:42Z
dc.date.issued2022
dc.identifier.issn0741-3106
dc.identifier.issn1558-0563
dc.identifier.urihttps://hdl.handle.net/1721.1/143697
dc.description.abstractAlGaN alloys are promising for field emission devices due to their low electron affinities. However, there have been limited demonstrations of AlGaN vacuum transistors so far. This paper combines a new self-alignedgate (SAG) process and digital-etching tip sharpening to demonstrate three-terminal AlGaN SAG field emitter arrays (FEAs). These devices show a turn-on voltage of 19.5 V and an anode current density (JA) of 100 mA/cm2 at an overdrive voltage of 20 V, which are comparable with best Si devices. The AlGaN SAGFEAs can operate in DC mode at a fixed gate-emitter voltage (VGE) with JA of 3-5 mA/cm2 for at least 5 hours without a significant degradation. The gate leakage does not increase after the long DC operation, suggesting high-performance and stable AlGaN vacuum transistors.en_US
dc.description.sponsorshipAFOSR through MURI ESE programen_US
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.isversionof10.1109/led.2022.3184996en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourcePao-Chuan Shihen_US
dc.titleStable and High Performance AlGaN Self-Aligned-Gate Field Emitter Arraysen_US
dc.typeArticleen_US
dc.identifier.citationShih, Pao-Chuan, Rughoobur, Girish, Engel, Zachary, Ahmad, Habib, Doolittle, William Alan et al. 2022. "Stable and High Performance AlGaN Self-Aligned-Gate Field Emitter Arrays." IEEE Electron Device Letters.
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratories
dc.relation.journalIEEE Electron Device Lettersen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.identifier.doi10.1109/LED.2022.3184996
dspace.date.submission2022-07-12T18:11:13Z
mit.licenseOPEN_ACCESS_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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