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dc.contributor.authorAgrawal, Abhinandan
dc.contributor.authorPark, Juhyun
dc.contributor.authorRyu, Du Y.
dc.contributor.authorHammond, Paula T.
dc.contributor.authorRussell, Thomas P.
dc.contributor.authorMcKinley, Gareth H.
dc.date.accessioned2005-08-22T19:33:42Z
dc.date.available2005-08-22T19:33:42Z
dc.date.issued2005-08-22T19:33:42Z
dc.identifier.urihttp://hdl.handle.net/1721.1/25318
dc.description.abstractThe presence of nanobubbles—as imaged with tapping-mode atomic force microscopy— is controlled using nanopatterned surfaces possessing repeating patterns of polystyrene (hydrophobic domains) and polymethyl-methacrylate (hydrophilic domains). For nanobubbles to be present, we find that, in addition to controlling the degree of surface hydrophobicity, it is important for the spatial dimensions of the hydrophobic domains on the nanopatterned surface to be commensurate with the equilibrium topology of the nanobubbles.en
dc.description.sponsorshipNSF-NIRT (Nanoscale Interdisciplinary Research Team on Nanoscale Wetting)en
dc.format.extent555709 bytes
dc.format.mimetypeapplication/pdf
dc.language.isoen_USen
dc.relation.ispartofseries05-P-09en
dc.subjectNanobubblesen
dc.subjectAFMen
dc.subjectHydrophobic surfaceen
dc.subjectLithographyen
dc.titleControlling the Location and Spatial Extent of Nanobubbles Using Hydrophobically Nanopatterned Surfacesen
dc.typePreprinten


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