Show simple item record

dc.contributor.advisorJung Hoon Chun.en_US
dc.contributor.authorHsiao, Wen Kai, 1972-en_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Mechanical Engineering.en_US
dc.date.accessioned2005-09-06T21:44:29Z
dc.date.available2005-09-06T21:44:29Z
dc.date.copyright2004en_US
dc.date.issued2004en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/27100
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2004.en_US
dc.descriptionIncludes bibliographical references (leaves 158-162).en_US
dc.description.abstractRecent advances in microdroplet generation and deposition processes have made it possible to directly form solder bumps on integrated circuits using micron-sized molten metal droplets. The direct droplet deposition bumping process can potentially produce uniform-sized bumps more economically than the existing processes such as plating and stencil printing. However, the development of this new bumping method is still in its infancy, particularly because of a lack of understanding about the post-impact deposition behavior of molten droplets on solid targets. A deposited molten on the deposition efficiency, as well as on the final bump size and shape. The present study investigates the effects of wetting and surface roughness on droplet bouncing during solder bump formation. The potential for droplet bouncing is modeled based on the energy difference between the maximum spreading and equilibrium sessile stages of a deposited droplet. Validated by experimental results, the model shows that strong droplet-surface wetting can significantly reduce the tendency for a deposited droplet to bounce. The effect of surface droplet can sometimes recoil violently after the initial spreading and rebound off the target surface. Such behavior, known as bouncing, has a strong influence roughness on the bouncing potential is represented by the roughness-induced incomplete wetting during droplet deposition, a phenomenon quantified by a change in the effective contact area under the deposited droplet. An idealized surface model is used to represent the real surface and to describe the relationship between various roughness parameters to changes in the effective contact area. The theoretical analysis, validated by empirical data, shows that surface effectiveen_US
dc.description.abstract(cont.) contact area. The theoretical analysis, validated by empirical data, shows that surface roughness promotes bouncing during solder bump formation. The results from this study suggest that droplet bouncing during solder bump formation may be effectively controlled by improving the surface wetting and minimizing the substrate surface roughness. The knowledge gained is also relevant to other droplet-based manufacturing processes such as spray forming, coating, and rapid prototyping.en_US
dc.description.statementofresponsibilityby Wen-Kai Hsiao.en_US
dc.format.extent166 leavesen_US
dc.format.extent13354521 bytes
dc.format.extent13376541 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMechanical Engineering.en_US
dc.titleEffects of surface properties on solder bump formation by direct droplet depositionen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineering
dc.identifier.oclc56835672en_US


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record