Wafer surface cleaning for silicon homoepitaxy with and without ECR hydrogen plasma exposure

Author(s)
Kim, Hyoun-woo
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Advisor
Rafael Reif.
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Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1994.
 
Includes bibliographical references (leaves 138-143).
 
Date issued
1994
URI
http://hdl.handle.net/1721.1/28125
Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Publisher
Massachusetts Institute of Technology
Keywords
Materials Science and Engineering
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