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dc.contributor.advisorW. Craig Carter and Edwin L. Thomas.en_US
dc.contributor.authorMaldovan, Martinen_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Materials Science and Engineering.en_US
dc.date.accessioned2006-03-24T18:21:32Z
dc.date.available2006-03-24T18:21:32Z
dc.date.copyright2004en_US
dc.date.issued2004en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/30121
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2004.en_US
dc.descriptionIncludes bibliographical references (leaves 103-104).en_US
dc.description.abstractIn the infinite set of possible photonic band gap structures there are no simple rules to serve as a guide in the search for optimal designs. The existence and characteristics of photonic band gaps depend on such factors as dielectric contrast, volume fraction, symmetry and connectivity of the dielectric structure. In this thesis a large set of photonic structures are developed to help understand the nature of the dependencies and provide a platform for easy fabrication of three-dimensional structures with large complete photonic band gaps. Two approaches for accessing new structures are examined. A systematic method based on crystallography to search for photonic band gap structures is established in this thesis. A search within the FCC space groups is undertaken resulting in the discovery of two new photonic band gap structures. Specific structures found in self-organizing systems, the single P, the single G, and single D structures, are shown to possess large photonic band gaps. Design guidelines to fabricate these structures by interference lithography are given. A layer-by-layer approximation of the single D structure amenable to fabrication by conventional semiconductor fabrication techniques is proposed. A second technique for obtaining photonic band gap structures with different topologies is based on the splitting of nodes in the diamond network. The realization of these structures using block copolymer self assembly and layer-by-layer lithographic technique are briefly examined.en_US
dc.description.statementofresponsibilityby Martin Maldovan.en_US
dc.format.extent104 leavesen_US
dc.format.extent3866580 bytes
dc.format.extent3866388 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineering.en_US
dc.titleExploring for new photonic band gap structuresen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc55858414en_US


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