| dc.contributor.advisor | Duane S. Boning. | en_US |
| dc.contributor.author | Claman, Jonathan L. (Jonathan Leonard) | en_US |
| dc.date.accessioned | 2007-01-10T15:59:26Z | |
| dc.date.available | 2007-01-10T15:59:26Z | |
| dc.date.copyright | 1994 | en_US |
| dc.date.issued | 1994 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/35386 | |
| dc.description | Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994. | en_US |
| dc.description | Includes bibliographical references (leaves 51-52). | en_US |
| dc.description.statementofresponsibility | by Jonathan L. Claman. | en_US |
| dc.format.extent | iv, 72 leaves | en_US |
| dc.format.extent | 3838363 bytes | |
| dc.format.extent | 3841561 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Electrical Engineering and Computer Science | en_US |
| dc.title | Real time interferometric imaging of the plasma etch process | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.Eng. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 31162756 | en_US |