Now showing items 1-3 of 3
Length Effects on the Reliability of Dual-Damascene Cu Interconnects
The effects of interconnect length on the reliability of dual-damascene Cu metallization have been investigated. As in Al-based interconnects, the lifetimes of Cu lines increase with decreasing length. However, unlike ...
Processing, Structure, Properties, and Reliability of Metals for Microsystems
Research on the processing, structure, properties and reliability of metal films and metallic microdevice elements is reviewed. Recent research has demonstrated that inelastic deformation mechanisms of metallic films and ...
Research on Polycrystalline Films for Micro- and Nano-Systems
Polycrystalline films are used in a wide array of micro- and nano-scale devices, for electronic, mechanical, magnetic, photonic and chemical functions. Increasingly, the properties, performance, and reliability of films ...