The interfacial reaction of Ni on (100) Si₁âxGex (x=0, 0.25) and (111) Ge
Author(s)Jin, Lijuan; Pey, Kin Leong; Choi, Wee Kiong; Fitzgerald, Eugene A.; Antoniadis, Dimitri A.; Pitera, Arthur J.; Lee, Minjoo L.; Chi, D.Z.; ... Show more Show less
The interfacial reaction of Ni with Si, Si₀.₇₅Ge₀.₂₅, and Ge at 400°C has been investigated. A uniform epitaxial NiSi film was obtained at 400°C for Ni-Silicidation on Si using rapid thermal annealing method. Similarly, uniform film of NiGe was formed at 400°C for Ni reaction with Ge. Whereas using in situ annealing at 400°C, Ni₃Ge₂ and NiGe were observed. For the interfacial reaction of Ni with relaxed Si₀.₇₅Ge₀.₂₅ films rapid thermal annealed at 400°C, a mixed layer consisting of Ni₃(Si₁âxGex)₂, Ni(Si₁âyGey), and Si₁âzGez (z>y>x) was formed; whereas only Ni₃(Si₁âxGex)₂ and Ni(Si₁âyGey>) were observed by in situ annealing.
Advanced Materials for Micro- and Nano-Systems (AMMNS);
Ni-germanosilicide, in situ annealing