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dc.contributor.advisorDavid E. Hardt.en_US
dc.contributor.authorKim, Hyung-Junen_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Mechanical Engineering.en_US
dc.date.accessioned2007-08-03T18:26:09Z
dc.date.available2007-08-03T18:26:09Z
dc.date.copyright2006en_US
dc.date.issued2006en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/38290
dc.descriptionThesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2006.en_US
dc.descriptionIncludes bibliographical references (leaves 79-82).en_US
dc.description.abstractThis dissertation is a final documentation of the project whose goal is demonstrating manufacturability of soft lithography. Specifically, our target is creating micron scale patterns of resists on a 3 square inch, relatively large area in case of soft lithography, flexible substrate using microcontact printing in order to forming electronic circuit patterns for flexible displays. At first, the general principles and characteristics of soft lithography are reviewed in order to provide the snapshot of soft lithography technologies, and the key factors that affect the productivity and quality of microcontact printing are discussed because such factors should be understood in advanced to develop current lab-based microcontact printing science into plant manufacturing technology. We proposed a prototype for automated of microcontact printing process adopting a continuous reel-to-reel design, ideal for mass production, as well as printing-side-up design in order to minimize the distortion of relief features of PDMS stamp. The machine we created not only demonstrated the manufacturability of microcontact printing, our initial project goal, but also high scalability for mass production. The machine can print micron scale patterns on a 7 square inch plastic sheet, four times bigger than initial target area, at once.en_US
dc.description.statementofresponsibilityby Hyung-Jun Kim.en_US
dc.format.extent82 leavesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMechanical Engineering.en_US
dc.titleAutomation of soft lithographyen_US
dc.typeThesisen_US
dc.description.degreeM.Eng.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineering
dc.identifier.oclc153295943en_US


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