TiNi-based thin films for MEMS applications

dc.contributor.author	Fu, Yongqing
dc.contributor.author	Du, Hejun
dc.contributor.author	Huang, Weimin
dc.contributor.author	Zhang, Sam
dc.contributor.author	Hu, Min
dc.date.accessioned	2003-12-13T17:59:05Z
dc.date.available	2003-12-13T17:59:05Z
dc.date.issued	2004-01
dc.identifier.uri	http://hdl.handle.net/1721.1/3844
dc.description.abstract	In this paper, some critical issues and problems in the development of TiNi thin films were discussed, including preparation and characterization considerations, residual stress and adhesion, frequency improvement, fatigue and stability, as well as functionally graded or composite thin film design. Different types of MEMS applications were reviewed and the prospects for future advances in fabrication process and device development were discussed.	en
dc.description.sponsorship	Singapore-MIT Alliance (SMA)	en
dc.format.extent	297584 bytes
dc.format.mimetype	application/pdf
dc.language.iso	en_US
dc.relation.ispartofseries	Advanced Materials for Micro- and Nano-Systems (AMMNS);
dc.subject	shape-memory	en
dc.subject	TiNi	en
dc.subject	sputtering	en
dc.subject	thin films	en
dc.subject	MEMS	en
dc.subject	microactuator	en
dc.subject	microsensor	en
dc.title	TiNi-based thin films for MEMS applications	en
dc.type	Article	en