| dc.contributor.advisor | Herbert H. Sawin. | en_US |
| dc.contributor.author | Lawing, Andrew S. (Andrew Scott) | en_US |
| dc.date.accessioned | 2007-08-29T21:01:37Z | |
| dc.date.available | 2007-08-29T21:01:37Z | |
| dc.date.copyright | 1997 | en_US |
| dc.date.issued | 1997 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/38852 | |
| dc.description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1997. | en_US |
| dc.description | Includes bibliographical references. | en_US |
| dc.description.statementofresponsibility | by Andrew Soctt Lawing. | en_US |
| dc.format.extent | 246 p. | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Chemical Engineering | en_US |
| dc.title | Gas-phase cleaning of silicon wafer surfaces | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Chemical Engineering | |
| dc.identifier.oclc | 39171409 | en_US |
