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dc.contributor.advisorHans-Conrad zur Loye.en_US
dc.contributor.authorHoumes, Joel Daviden_US
dc.date.accessioned2008-04-23T14:56:37Z
dc.date.available2008-04-23T14:56:37Z
dc.date.copyright1996en_US
dc.date.issued1996en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/41411
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemistry, 1996.en_US
dc.descriptionIncludes bibliographical references.en_US
dc.description.statementofresponsibilityby Joel David Houmes.en_US
dc.format.extent238 leavesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectChemistryen_US
dc.titleNew routes to nitride materials : oxide precursors and nitrogen plasmasen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Dept. of Chemistryen_US
dc.identifier.oclc36146756en_US


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