| dc.contributor.advisor | David A. Rudman and Alfredo C. Anderson. | en_US |
| dc.contributor.author | Lichtenwalner, Daniel Jenner | en_US |
| dc.date.accessioned | 2008-09-03T15:45:05Z | |
| dc.date.available | 2008-09-03T15:45:05Z | |
| dc.date.copyright | 1990 | en_US |
| dc.date.issued | 1990 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/42466 | |
| dc.description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990. | en_US |
| dc.description | Vita. | en_US |
| dc.description | Includes bibliographical references (leaves 284-290). | en_US |
| dc.description.statementofresponsibility | by Daniel Jenner Lichtenwalner. | en_US |
| dc.format.extent | 2 v. (329 leaves) | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Materials Science and Engineering | en_US |
| dc.title | The ion-beam reactive sputtering process for deposition of niobium nitride thin films | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
| dc.identifier.oclc | 24250339 | en_US |
