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dc.contributor.advisorCaroline A. Ross.en_US
dc.contributor.authorDu, Lei, M. Eng. Massachusetts Institute of Technologyen_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Materials Science and Engineering.en_US
dc.date.accessioned2009-04-29T17:30:49Z
dc.date.available2009-04-29T17:30:49Z
dc.date.copyright2008en_US
dc.date.issued2008en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/45362
dc.descriptionThesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008.en_US
dc.descriptionIncludes bibliographical references (leaves 51-55).en_US
dc.description.abstractHard drive industry is facing scaling challenge for areal density to be further increased. This is due to the triangular conflictions among thermal stability (superparamagnetic effect), single-to-noise ratio and writability of the recording media. One of the most promising methods to overcome this constraint is the patterned magnetic media technology. Although it is facing many challenges, the large potential gains in density offered by patterned media make it one of the possible milestones on the horizon for future of the disk drives industry. One of the biggest challenges for patterned media is to realize its mass fabrication provided reduced cost per bit. The basic fabrication approach is to use lithography to pattern the magnetic materials on the platter. However, patterned media requires well-ordered nanoarrays with dimensions less than 25 nm, which challenges the state-of-art lithography technologies. This M. Eng. project focuses on evaluations of the technologies and fabrication schemes potential for patterned media from various aspects like technical barriers, cost and intellectual properties. Technologies including E-beam lithography, nanoimprint lithography, templated diblock copolymer self-assembly and self-assembled magnetic nanoparticles are discussed. Cost modeling was done to prove the enormous gain in revenue for the proposed fabrication scheme. It is proposed that the fabrication scheme of templated diblock copolymer for making the master stamp for nanoimprint followed by nanoimprint lithography for mass production has the largest potential for patterned media. However, more R & D is needed for templated self-assembly of diblock copolymer before it is ready for this application.en_US
dc.description.abstract(cont.) E-beam lithography which is a mature technology can also be a choice for making the stamp followed by mass production enabled by nanoimprint lithography, without a significant loss of gain in revenue for ultra-high-density media fabrications. Although the cost of a master stamp fabricated by E-beam is estimated to be 50 times more than for templated self-assembly of diblock copolymer lithography.en_US
dc.description.statementofresponsibilityby Lei Du.en_US
dc.format.extent65 leavesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectMaterials Science and Engineering.en_US
dc.titleEconomic potential of high density data storage implemented by patterned magnetic media technologyen_US
dc.typeThesisen_US
dc.description.degreeM.Eng.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc316803699en_US


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