| dc.contributor.advisor | Martin L. Culpepper. | en_US |
| dc.contributor.author | Luttkus, Jessica (Jessica D.) | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Dept. of Mechanical Engineering. | en_US |
| dc.date.accessioned | 2009-04-29T17:33:27Z | |
| dc.date.available | 2009-04-29T17:33:27Z | |
| dc.date.copyright | 2008 | en_US |
| dc.date.issued | 2008 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/45381 | |
| dc.description | Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2008. | en_US |
| dc.description | Includes bibliographical references (p. 29). | en_US |
| dc.description.abstract | A manufacturing line to support dip pen nanolithography on a massive scale is justified and described. Appropriate machines are evaluated based on key parameters such as cost, rate, and resolution. Methods for comparing lines are discussed, and solutions for lowest cost and fastest lines are provided. | en_US |
| dc.description.statementofresponsibility | by Jessica Luttkus. | en_US |
| dc.format.extent | 29 p. | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Mechanical Engineering. | en_US |
| dc.title | Development of a nanomanufacturing line to support dip-pen nanolithography on a massive scale | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | S.B. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Mechanical Engineering | |
| dc.identifier.oclc | 317304327 | en_US |
