| dc.contributor.advisor | Carl V. Thompson II and Chee Lip Gan. | en_US |
| dc.contributor.author | Nagarajan, Raghavan | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. | en_US |
| dc.date.accessioned | 2009-04-29T17:34:30Z | |
| dc.date.available | 2009-04-29T17:34:30Z | |
| dc.date.copyright | 2008 | en_US |
| dc.date.issued | 2008 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/45389 | |
| dc.description | Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. | en_US |
| dc.description | Includes bibliographical references (p. 84-87). | en_US |
| dc.description.abstract | Wafer bonding is a key process and enabling technology for realization of three-dimensional integrated circuits (3DIC) with reduced interconnect delay and correspondingly increased circuit speed and decreased power dissipation, along with an improved form factor and portability. One of the most recent novel and promising wafer bonding approaches to realizing 3DIC is Low Temperature Thermocompression (LTTC) bonding using copper (Cu) as the bonding interface material. This thesis investigates the LTTC bonding approach in terms of its technological implications in contrast to other conventional bonding approaches. The various technological aspects pertaining to LTTC are comprehensively explored and analyzed. In addition to this, the commercialization potential for this technology is also studied and the economic viability of this process in production is critically evaluated using suitable cost models. Based on the technological and economic outlook, the potential for commercialization of LTTC is gauged. | en_US |
| dc.description.statementofresponsibility | by Raghavan Nagarajan. | en_US |
| dc.format.extent | 87 p. | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Materials Science and Engineering. | en_US |
| dc.title | Commercialization of low temperature copper thermocompression bonding for 3D integrated circuits | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.Eng. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
| dc.identifier.oclc | 317401219 | en_US |