| dc.contributor.advisor | Michael J. Cima. | en_US |
| dc.contributor.author | Stefanik, Todd Stanley, 1973- | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. | en_US |
| dc.date.accessioned | 2009-10-01T15:29:22Z | |
| dc.date.available | 2009-10-01T15:29:22Z | |
| dc.date.copyright | 1996 | en_US |
| dc.date.issued | 1996 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/47650 | |
| dc.description | Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996. | en_US |
| dc.description | Includes bibliographical references (leaves 108-110). | en_US |
| dc.description.statementofresponsibility | by Todd S. Stefanik. | en_US |
| dc.format.extent | 110 leaves | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Materials Science and Engineering. | en_US |
| dc.title | The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | S.M. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
| dc.identifier.oclc | 41881583 | en_US |
