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dc.contributor.advisorRafael Reif.en_US
dc.contributor.authorPruette, Laura C. (Laura Catherine), 1974-en_US
dc.date.accessioned2009-12-10T19:02:59Z
dc.date.available2009-12-10T19:02:59Z
dc.date.copyright1998en_US
dc.date.issued1998en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/50031
dc.descriptionThesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1998.en_US
dc.descriptionIncludes bibliographical references (p. 99-101).en_US
dc.description.statementofresponsibilityby Laura C. Pruette.en_US
dc.format.extent102 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectElectrical Engineering and Computer Scienceen_US
dc.titleNon-perfluorocompound chemistries for dielectric etching applicationsen_US
dc.typeThesisen_US
dc.description.degreeM.S.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc40295566en_US


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