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Applied Plasma Research

dc.contributor.authorRome, J. A.en_US
dc.contributor.authorBriggs, R. J.en_US
dc.date.accessioned2010-06-30T20:21:52Z
dc.date.available2010-06-30T20:21:52Z
dc.date.issued1969-10-15en_US
dc.identifierRLE_QPR_095_VIIIen_US
dc.identifier.urihttp://hdl.handle.net/1721.1/56026
dc.descriptionContains report on one research project.en_US
dc.description.sponsorshipNational Science Foundation (Grant GK-10472)en_US
dc.description.sponsorshipJoint Services Electronics Programs (U. S. Army, U.S. Navy, and U.S. Air Force) under Contract DA 28-043-AMC-02536(E)en_US
dc.language.isoenen_US
dc.publisherResearch Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)en_US
dc.relation.ispartofMassachusetts Institute of Technology, Research Laboratory of Electronics, Quarterly Progress Report, October 15, 1969en_US
dc.relation.ispartofPlasma Dynamicsen_US
dc.relation.ispartofApplied Plasma Researchen_US
dc.relation.ispartofseriesMassachusetts Institute of Technology. Research Laboratory of Electronics. Quarterly Progress Report, no. 95en_US
dc.rightsCopyright (c) 2008 by the Massachusetts Institute of Technology. All rights reserved.en_US
dc.subject.otherApplied Plasma Researchen_US
dc.subject.otherApplied Plasma Systemsen_US
dc.titleApplied Plasma Researchen_US
dc.typeTechnical Reporten_US


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