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dc.contributor.authorMusil, Christianen_US
dc.contributor.authorMelngailis, Johnen_US
dc.contributor.authorStevens, Eugene H.en_US
dc.contributor.authorBartelt, Johnen_US
dc.contributor.authorUtlaut, Marken_US
dc.contributor.authorPost, Richarden_US
dc.contributor.authorKellog, Edwinen_US
dc.contributor.authorGeiss, Michael W.en_US
dc.contributor.authorMountain, Robert W.en_US
dc.contributor.authorShedd, Gordon M.en_US
dc.contributor.authorLezec, Henri J.en_US
dc.contributor.authorDubner, Andrew D.en_US
dc.contributor.authorJacobs, Jarvis B.en_US
dc.contributor.authorLowther, Rex E.en_US
dc.contributor.authorMahoney, Leonard J.en_US
dc.contributor.authorAntoniadis, Dimitri A.en_US
dc.date.accessioned2010-07-15T22:10:06Z
dc.date.available2010-07-15T22:10:06Z
dc.date.issued1986-01en_US
dc.identifierRLE_PR_128_03en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/56969
dc.descriptionContains summary of research program and reports on four research projects.en_US
dc.description.sponsorshipCharles Stark Draper Laboratory (Contract DL-H-225270)en_US
dc.description.sponsorshipHughes Research Laboratoriesen_US
dc.description.sponsorshipInternational Business Machines, Inc. (Contract 456614)en_US
dc.description.sponsorshipNippon Telegraph and Telephone, Inc.en_US
dc.description.sponsorshipU.S. Navy - Office of Naval Research (Contract N00014-84-K-0073)en_US
dc.description.sponsorshipU.S. Department of Defense (Contract MDA903-85-C-0215)en_US
dc.description.sponsorshipHitachi Central Research Laboratoryen_US
dc.language.isoenen_US
dc.publisherResearch Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)en_US
dc.relation.ispartofMassachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1986en_US
dc.relation.ispartofFocused Ion Beam Fabricationen_US
dc.relation.ispartofseriesMassachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 128en_US
dc.rightsCopyright (c) 2008 by the Massachusetts Institute of Technology. All rights reserved.en_US
dc.subject.otherFocused Ion Beam Fabricationen_US
dc.subject.otherFocused Ion Beam Microsurgery of Integrated Circuitsen_US
dc.subject.otherIon Beam Assisted Depositionen_US
dc.subject.otherFabrication of Graded Channel FET's in GaAsen_US
dc.subject.otherFabrication of Graded Channel FET's in Sien_US
dc.subject.otherMeasurement of Beam Profileen_US
dc.titleFocused Ion Beam Fabricationen_US
dc.typeTechnical Reporten_US


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