| dc.contributor.author | Ceyer, Sylvia T. | en_US |
| dc.contributor.author | Li, Yulin | en_US |
| dc.contributor.author | Pullman, David P. | en_US |
| dc.contributor.author | Yang, Julius J. | en_US |
| dc.contributor.author | Cain, Gerald R. | en_US |
| dc.contributor.author | Utz, Arthur L. | en_US |
| dc.contributor.author | Johnson, Andrew D. | en_US |
| dc.contributor.author | Daley, Sean P. | en_US |
| dc.contributor.author | Trautman, Theodore R. | en_US |
| dc.date.accessioned | 2010-07-16T04:31:58Z | |
| dc.date.available | 2010-07-16T04:31:58Z | |
| dc.date.issued | 1991-01-01 to 1991-12-31 | en_US |
| dc.identifier | RLE_PR_134_01_04s_03 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/57195 | |
| dc.description | Contains reports on three research projects. | en_US |
| dc.description.sponsorship | Joint Services Electronics Program Contract DAAL03-89-C-0001 | en_US |
| dc.description.sponsorship | Joint Services Electronics Program Contract DAAL03-92-C-0001 | en_US |
| dc.description.sponsorship | National Science Foundation Grant CHE 90-20623 | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT) | en_US |
| dc.relation.ispartof | Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1991 | en_US |
| dc.relation.ispartof | Solid State Physics, Electronics and Optics | en_US |
| dc.relation.ispartof | Surfaces and Interfaces | en_US |
| dc.relation.ispartof | Chemical Reaction Dynamics at Surfaces | en_US |
| dc.relation.ispartofseries | Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 134 | en_US |
| dc.rights | Copyright (c) 2008 by the Massachusetts Institute of Technology. All rights reserved. | en_US |
| dc.subject.other | Chemical Reaction Dynamics at Surfaces | en_US |
| dc.subject.other | Dynamics of the Reaction of F₂ with Si(100) | en_US |
| dc.subject.other | Dynamics of the Reaction of F₂ with Fluorinated Si(100) | en_US |
| dc.subject.other | New Mechanisms for Surface Processes | en_US |
| dc.title | Chemical Reaction Dynamics at Surfaces | en_US |
| dc.type | Technical Report | en_US |
