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Nanostructures Technology, Research, and Applications

dc.contributor.authorSmith, Henry I.en_US
dc.contributor.authorSilverman, Scott E.en_US
dc.contributor.authorFerrera, Juanen_US
dc.contributor.authorWong, Vincent V.en_US
dc.contributor.authorCarter, James M.en_US
dc.contributor.authorHector, Scott D.en_US
dc.contributor.authorMoon, Euclid E.en_US
dc.contributor.authorOwen, Gabrielle M.en_US
dc.contributor.authorSchattenburg, Mark L.en_US
dc.contributor.authorYang, Isabel Y.en_US
dc.contributor.authorBurkhardt, Martinen_US
dc.contributor.authorLi, Huiyingen_US
dc.contributor.authorMondol, Mark K.en_US
dc.contributor.authorMurphy, Edwarden_US
dc.contributor.authorEverett, Patrick N.en_US
dc.contributor.authorFleming, Robert C., Jr.en_US
dc.contributor.authorSavas, Timothy A.en_US
dc.contributor.authorShah, Satyen N.en_US
dc.contributor.authorYasaka, Antoen_US
dc.contributor.authorJackson, Keith M.en_US
dc.contributor.authorAntoniadis, Dimitri A.en_US
dc.contributor.authorGupta, Nitinen_US
dc.contributor.authorMelloch, Michael R.en_US
dc.contributor.authorHugunin, James J.en_US
dc.contributor.authorFonstad, Clifton G., Jr.en_US
dc.contributor.authorDamask, Jay N.en_US
dc.contributor.authorAucoin, Richard J.en_US
dc.contributor.authorCanizares, Claude R.en_US
dc.contributor.authorPorter, Jeanne M.en_US
dc.contributor.authorDonovan, Sean M.en_US
dc.contributor.authorIsmail, Khaliden_US
dc.contributor.authorKolodziejski, Leslie A.en_US
dc.contributor.authorThompson, Carl V.en_US
dc.date.accessioned2010-07-16T20:33:45Z
dc.date.available2010-07-16T20:33:45Z
dc.date.issued1994-01-01 to 1994-12-31en_US
dc.identifierRLE_PR_137_01_02s_05en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/57290
dc.descriptionContains reports on seventeen research projects and a list of publications.en_US
dc.description.sponsorshipJoint Services Electronics Program Contract DAAL03-92-C-0001en_US
dc.description.sponsorshipJoint Services Electronics Program Grant DAAH04-95-1-0038en_US
dc.description.sponsorshipSemiconductor Research Corporation Contract 94-MJ-550en_US
dc.description.sponsorshipNational Science Foundation Grant ECS 94-07078en_US
dc.description.sponsorshipU.S. Army Research Office Contract DAAL03-92-G-0291en_US
dc.description.sponsorshipAdvanced Research Projects Agency/Naval Air Systems Command Contract N00019-92-K-0021en_US
dc.description.sponsorshipNational Aeronautics and Space Administration Contract NAS8-36748en_US
dc.description.sponsorshipNational Aeronautics and Space Administration Grant NAGW-2003en_US
dc.description.sponsorshipIBM Corporation Contract 1622en_US
dc.description.sponsorshipU.S. Army Research Office Grant DAAH04-94-G-0377en_US
dc.description.sponsorshipU.S. Air Force - Office of Scientific Research Grant F-49-620-92-J-0064en_US
dc.language.isoenen_US
dc.publisherResearch Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)en_US
dc.relation.ispartofMassachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1994en_US
dc.relation.ispartofSolid State Physics, Electronics and Opticsen_US
dc.relation.ispartofQuantum-Effect Devicesen_US
dc.relation.ispartofNanostructures Technology, Research, and Applicationsen_US
dc.relation.ispartofseriesMassachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 137en_US
dc.rightsCopyright (c) 2008 by the Massachusetts Institute of Technology. All rights reserved.en_US
dc.subject.otherNanostructures Technologyen_US
dc.subject.otherNanostructures Researchen_US
dc.subject.otherNanostructures Applicationsen_US
dc.subject.otherNanoStructures Laboratoryen_US
dc.subject.otherScanning Electron Beam Lithographyen_US
dc.subject.otherSpatial-Phase-Locked Electron-Beam Lithographyen_US
dc.subject.otherX-Ray Nanolithographyen_US
dc.subject.otherImproved Mask Technology for X-Ray Lithographyen_US
dc.subject.otherHigh-Precision Mask Alignment Systemen_US
dc.subject.otherInterferometric Lithographyen_US
dc.subject.otherIon-Beam Lithographyen_US
dc.subject.otherHigh-Performance Self-aligned Sub-100 nm MOSFETs Using X-ray Lithographyen_US
dc.subject.otherFabrication of T-gate Devices using X-ray Lithographyen_US
dc.subject.otherCoulomb Charging Effects in Semiconductor Nanostructuresen_US
dc.subject.otherCoulomb Charging Tunneling in Semiconductor Nanostructuresen_US
dc.subject.otherSuperconductor/Semiconductor Interface of V₃Sien_US
dc.subject.otherSuperconductor/Semiconductor Interface of Sien_US
dc.subject.otherLaterally-Coupled Distributed-Feedback Lasers Fabricated by X-Ray Lithographyen_US
dc.subject.otherCombined Spatial-Phase-Locked Electron-Beam for Channel-Dropping Filtersen_US
dc.subject.otherCombined Spatial-Phase-Locked X-ray for Channel-Dropping Filtersen_US
dc.subject.otherCombined Spatial-Phase-Locked Optical Lithography for Channel-Dropping Filtersen_US
dc.subject.otherHigh-Dispersion, High-Efficiency Transmission Gratings for Astrophysical X-ray Spectroscopyen_US
dc.subject.otherSubmicrometer-Period Transmission Gratings for X-ray Spectroscopyen_US
dc.subject.otherSubmicrometer-Period Transmission Gratings for X-ray Interferometryen_US
dc.subject.otherSubmicrometer-Period Transmission Gratings for Atom-Beam Spectroscopyen_US
dc.subject.otherSubmicrometer-Period Transmission Gratings for Atom-Beam Interferometryen_US
dc.subject.otherGaAs Epitaxy on Sawtooth-Patterned Siliconen_US
dc.titleNanostructures Technology, Research, and Applicationsen_US
dc.typeTechnical Reporten_US


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